1[期刊论文]

Energy loss distribution of H2+ with ∼ 100 keV in thin carbon films

作者：Noriaki Matsunami

来源：Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 1996 ;115(1-4):55-57.doi:10.1016/0168-583X(95)01510-8

出版社：Elsevier BV

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2[期刊论文]

Inelastic mean free path of H+ and He+ with the energy of ∼ 100 keV in carbon film

作者：Noriaki Matsunami

来源：Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 1996 ;115(1-4):14-17.doi:10.1016/0168-583X(95)01545-0

出版社：Elsevier BV

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3[期刊论文]

Sputtering yields of YBa2Cu3O7 and Bi2Sr2Ca2Cu3O10 by 100 keV Ar+ impact at normal incidence

作者：Noriaki Matsunami

来源：Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 1998 ;134(3-4):346-351.doi:10.1016/S0168-583X(97)00919-1

出版社：Elsevier BV

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4[期刊论文]

Solid state effects on tunneling probability for d+d nuclear fusion at room temperature

作者：Noriaki Matsunami

来源：Radiation Effects and Defects in Solids. 1990 ;112(4):181-188.doi:10.1080/10420159008213043

出版社：Taylor & Francis Group

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5[期刊论文]

Colloid formation effects on depth profile of implanted Ag in SiO ₂ glass

作者：Noriaki Matsunami ;Hideo Hosono

来源：Applied Physics Letters. 1993 ;63(15):2050-2052.doi:10.1063/1.110588

出版社：AIP Publishing

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6[期刊论文]

Energy loss distribution of 100 keV H+ in thin carbon films

作者：Noriaki Matsunami ;Kenshin Kitoh

来源：Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 1992 ;67(1-4):50-52.doi:10.1016/0168-583X(92)95769-N

出版社：Elsevier BV

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7[期刊论文]

Defect formation in amorphous SiO2 by ion implantation: Electronic excitation effects and chemical effects

作者：Hideo Hosono ;Noriaki Matsunami

来源：Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 1998 ;141(1-4):566-574.doi:10.1016/S0168-583X(98)00097-4

出版社：Elsevier BV

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8[期刊论文]

Validity of the continuum approximation in calculating the scattering yields for atom location

作者：Noriaki Matsunami ;Noriaki Itoh

来源：Radiation Effects and Defects in Solids. 1976 ;31(1):47-52.doi:10.1080/00337577608234779

出版社：Taylor & Francis Group

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9[期刊论文]

Coalescence of nanosized copper colloid particles formed in Cu‐implanted SiO ₂ glass by implantation of fluorine ions: Formation of violet copper colloids

作者：Hideo Hosono ;Yoshihiro Abe ;Noriaki Matsunami

来源：Applied Physics Letters. 1992 ;60(21):2613-2615.doi:10.1063/1.106897

出版社：AIP Publishing

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10[期刊论文]

New model of ion‐induced crystallization and amorphization of silicon

作者：Zhong‐Lie Wang ;Noriaki Itoh ;Noriaki Matsunami

来源：Applied Physics Letters. 1994 ;64(8):1000-1002.doi:10.1063/1.110951

出版社：AIP Publishing

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